PECVD Plasma Enhanced CVD Tube Furnace System Introduction
The
product has a solid-state plasma sources, the divided reaction gas
intake system, dynamic substrate temperature control, full control of
the vacuum system, with centralized control technology nobody control
software, and user-friendly interface to operate. Applicable for SiO2,
SiNx ,, SiONx a-Si thin film deposition at room temperature to 1200 ℃
condition , at the same time the products can achieve TEOS source
deposition, SiC film deposition, and other deposition liquid or gaseous
source materials, especially for high efficiency protective layer film
deposition of organic materials and no damage passivation film
deposition under a specific temperature.
PECVD Plasma Enhanced CVD Tube Furnace System Application
Plasma induced surface modification
- Plasma cleaning
- Plasma polymerization
- A variety of films deposited on the surface of SiOx, SiNx, amorphous silicon, microcrystalline silicon, nano-silicon, SiC, DLC, etc.
- selective growth of the carbon nanotubes (CNT)
PECVD Plasma Enhanced CVD Tube Furnace System main features
Cleaning coating one go, to prevent secondary pollution;
- Open structure, easy observation;
- Touch-screen interactive, safe and reliable;
- Products adopts automatic control mode, touch screen, digital display;
- Vacuum systems, working pressure, power systems and automatic matching, gas flow, heating systems, motion systems, system monitoring and data acquisition.
PECVD Plasma Enhanced CVD Tube Furnace System Working priciple
PECVD Plasma Enhanced CVD Tube Furnace System parameter
- Model: NBD-PECVD1200-80ITD2Z
- Special screw dual reaction chamber system
- Mechanical pumpwith control power
- RF generator
- Fully digital touch screen temperature control system
- 2 channel mass flow meter (three channel mass flow meter available)
- PECVDdepostion: SiO2, SiNx ,, SiONx a-Si thin film deposition and diamond like carbon thin film depostion
- uniformty deviation:≤ ± 4％ ( within 3inch)
- working space: 3inch, 10pS
- Sample size:2-3″
- working temp: 100～1200℃
- temperature control accuracy: ≤ ±1℃
- Model: NBD-PECVD1200-80ITD2Z
- Cleaning and coating RFpower: 20~200Wadjustable
- Tube diameter: Φ80mm
- Length of Heating zone: 200mm
- Max temperature: 1200℃
- Size: L1300xH1260xW820
- Power:AC220V,4KW
- Weight: 360kg
If any question about mini tube furnace, please feel free to call us +86 18538509702 or email us:
nbd@nbdkj.com. we are happy to serve you.
About Nobody !
Dear friend! Nobody has been waiting for shaking hands with you for years. Actually Nobody Materials Science and Technology Co., Ltd. is a small but very strong company focusing on the R&D of thermal engineering equipment manufacture which are used in material science research.
Since establishing, we have developed 12 series more than 96 kinds of products to meet the needs of customer’s requirement all over the world. Which include
muffle furnace, lab box furnace,CVD tube furnace, vacuum furnace, bottom loading sintering furnace, lab dental zirconia sintering furnace, RTP furnace, pouring furnace, rotating tube furnace and PECVD system
. These products are widely used in the research of chemical and physical properties for the Nano materials, Semiconductor material, new Energy material, Phosphor material, Graphene and advanced ceramic material. Normally We promise one week delivery time for the standard PO and 42 working days for customer design PO. If you want to know more about us, please log on www.en.nbdkj.com where you can get more detail information, or you are highly welcome to visit our campus fabrication plant in Zhengzhou , China.
Our Product Range
· PECVD
· RTP Annealing Furnace
· CVD Atmosphere Tube Furnace
o 1200℃ Tube Furnace
o 1500℃ Tube Furnace
o 1700℃ tube furnace
o Mini Lab Tube Furnace
o Rotary Tube Furnace
o Vertical Tube Furnace
· CVD Furnace System
· Gas Mixing System
o Float Flow Meter
o Mass Flow Meter
· Dental Zirconia Sintering Furnace
o 1200℃ Dental Porcelain Furnace
o 1500℃ Bottom Loading Sintering Furnace
o 1700℃ Dental Zirconia Sintering Furnace
o Pre-heating/Dewaxing Furnace
· Muffle Furnace
o 1200℃ Muffle Furnace
o 1500℃ Muffle Furnace
o 1700℃ Muffle Furnace
o Microwave Muffle Furnace
o Vacuum Muffle Furnace
· Vertical Crucible Furnace
