PECVD Plasma Enhanced CVD Tube Furnace System Introduction
The product has a solid-state plasma sources, the divided reaction gas intake system, dynamic substrate temperature control, full control of the vacuum system, with centralized control technology nobody control software, and user-friendly interface to operate. Applicable for SiO2, SiNx ,, SiONx a-Si thin film deposition at room temperature to 1200 ℃ condition , at the same time the products can achieve TEOS source deposition, SiC film deposition, and other deposition liquid or gaseous source materials, especially for high efficiency protective layer film deposition of organic materials and no damage passivation film deposition under a specific temperature.
PECVD Plasma Enhanced CVD Tube Furnace System Application
Plasma induced surface modification
- Plasma cleaning
- Plasma polymerization
- A variety of films deposited on the surface of SiOx, SiNx, amorphous silicon, microcrystalline silicon, nano-silicon, SiC, DLC, etc.
- selective growth of the carbon nanotubes (CNT)
PECVD Plasma Enhanced CVD Tube Furnace System main features
Cleaning coating one go, to prevent secondary pollution;
- Open structure, easy observation;
- Touch-screen interactive, safe and reliable;
- Products adopts automatic control mode, touch screen, digital display;
- Vacuum systems, working pressure, power systems and automatic matching, gas flow, heating systems, motion systems, system monitoring and data acquisition.
PECVD Plasma Enhanced CVD Tube Furnace System Working priciple
PECVD Plasma Enhanced CVD Tube Furnace System parameter
- Model: NBD-PECVD1200-80ITD2Z
- Special screw dual reaction chamber system
- Mechanical pumpwith control power
- RF generator
- Fully digital touch screen temperature control system
- 2 channel mass flow meter (three channel mass flow meter available)
- PECVDdepostion: SiO2, SiNx ,, SiONx a-Si thin film deposition and diamond like carbon thin film depostion
- uniformty deviation:≤ ± 4％ ( within 3inch)
- working space: 3inch, 10pS
- Sample size:2-3″
- working temp: 100～1200℃
- temperature control accuracy: ≤ ±1℃
- Model: NBD-PECVD1200-80ITD2Z
- Cleaning and coating RFpower: 20~200Wadjustable
- Tube diameter: Φ80mm
- Length of Heating zone: 200mm
- Max temperature: 1200℃
- Size: L1300xH1260xW820
- Power:AC220V,4KW
- Weight: 360kg
